Pulsed Laser Deposition (PLD) Coater Machine for Complex Oxide Thin Films

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-PLD-450
• Application: Industry, School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Stainless Steel
• Loading Sample Size: 150*150mm
• Transport Package: Wooden Package
• Specification: 1800*1800mm
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486202200
• Production Capacity: 500 Sets Per Year

Product Description

KS-PLD-450 Pulsed Laser Deposition (PLD) System Description
The KS-PLD-450 Pulsed Laser Deposition system is a high-performance coating instrument specifically designed for advanced thin film research and deposition applications. It is ideally suited for fabricating complex multi-element, multilayered, or superlattice thin films, including optical crystals, ferroelectric and ferromagnetic materials, superconductors, and organic compounds. It is particularly beneficial for growing thin films involving high melting point materials or gaseous elements.

The system is composed of several key modules: the PLD vacuum chamber, vacuum generation system, vacuum measurement system, sample stage, rotating target stage, laser injection ports, and the intelligent electrical control cabinet. The deposition chamber adopts a spherical structure with a diameter of 450 mm, made of corrosion-resistant stainless steel (1Cr18Ni9Ti), ensuring durability and ultra-high vacuum sealing. The surface is finely treated with matte glass bead blasting for a professional finish. The chamber features several flange ports, quartz optical windows (for UV and IR wavelengths), and observation/viewing ports to support real-time monitoring and flexible system upgrades.
The rotating target platform can accommodate four target materials simultaneously, with each target capable of independent rotation. The targets are shielded to avoid cross-contamination, exposing only one material at a time during deposition. Target exchange and movement are handled by a stepper motor-driven magnetic coupling mechanism, enabling smooth and precise control over the target positioning and rotation speed (5-60 rpm).
The substrate heating stage supports samples up to 60 mm in diameter, and its heating capability reaches 800°C with high precision (±1°C), maintained through thermocouple feedback control. The heating stage also rotates at adjustable speeds (5-60 rpm) to ensure uniform film deposition. The target-substrate distance is manually adjustable between 20 and 80 mm to optimize film growth conditions.
Technical Parameters:

Product name	PLD pulse laser deposition evaporation coating instrument
Product model	KS-PLD-450
Main vacuum system	Sphere structure, size diameter. 450mm
Loading sample system	Vertical cylindrical structure, size diameter. 150×150mm
Vacuum system configuration (Main vacuum chamber)	Mechanical pump, molecular pump, valve
Vacuum system configuration (Loading sample system)	Mechanical pump and molecular pump (sharing with primary chamber), valve
Ultimate pressure (Main vacuum system)	≤6×10^-6 Pa (after baking and degassing)
Ultimate pressure (Loading sample system)	≤6×10^-3 Pa (after baking and degassing)
Vacuum recovery system (Main vacuum system)	5×10^-3 Pa in 20 minutes (system exposed to air briefly and filled with dry nitrogen before pumping)
Vacuum recovery system (Loading sample system)	5×10^-3 Pa in 20 minutes (same as above)
Rotating target platform	Max target size φ60mm; 4 target materials installable; each rotates independently; speed 5-60 rpm
Substrate heating platform - Sample size	φ51 mm
Substrate heating platform - Motion mode Continuous rotation, speed 5-60 rpm
Substrate heating platform - Heating temperature	Max 800°C ±1°C, controlled and adjustable
Gas circuit system	1-circuit mass flow controller, 1-circuit inflation valve
Laser device	Compatible with coherent 201 laser
Laser beam scanning device	2D mechanical platform, two-degree-of-freedom scanning
Computer control system	Includes target conversion, rotation, sample rotation, temperature control, laser scanning, etc.