Desktop Magnetron Plasma Sputtering Coater for Heat Sensitive Sem Samples

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-SD-900M
• Application: Industry, School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Stainless Steel
• Transport Package: Wooden Package
• Specification: 150*120mm
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486202200
• Production Capacity: 500 Sets Per Year

Product Description

Introduction
Magnetron Ion Sputtering Coater (KS-SD-900M Model) is ideal and designed for lab SEM sample preparation. It is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.

Coating Result Sample Picture under SEM (by KS-SD-900M Model) EPTFE (Extended Poly Tetra Fluoro Ethylene)
The KS-SD-900M is a high-performance desktop magnetron sputtering coater specially engineered for the precise coating of heat-sensitive samples in scanning electron microscopy (SEM). This compact and reliable system is capable of sputtering both gold (Au) and silver (Ag), offering uniform and conductive thin films critical for enhancing SEM imaging quality, especially when dealing with biological, polymeric, or low-thermal-resistance materials. With its elegant desktop design and user-friendly interface, the KS-SD-900M is ideal for laboratories with limited space yet high demands for precision and reproducibility.
One of the key highlights of the KS-SD-900M is its ability to operate under low-temperature conditions, making it suitable for specimens that are sensitive to heat. The integrated magnetron target head ensures stable plasma generation and consistent sputter rates, allowing users to coat samples quickly without compromising sample integrity. The device comes equipped with a transparent cylindrical vacuum chamber, providing full visibility during the coating process and ensuring real-time monitoring of sample placement and sputtering behavior.

The control panel features a digital timer, process current display, and vacuum gauge, offering precise control over each sputtering cycle. The system supports adjustable current and time settings, which can be fine-tuned depending on the coating thickness required. The vacuum chamber is evacuated through a reliable vacuum pump interface, ensuring a clean environment for high-quality film deposition. For users needing rapid cycle times, the system includes a leak valve for efficient chamber venting and reset.
This coater uses a magnetron-enhanced sputtering mechanism, which significantly increases coating efficiency and film adhesion. By focusing the magnetic field over the target, the system increases the ionization of argon gas, creating a denser plasma and improving the transfer of metal atoms to the sample surface. This method not only results in finer grain size and better conductivity but also reduces the deposition temperature compared to conventional thermal evaporation.

Parameter

Model	KS-SD-900M magnetron sputtering coater/coating machine
Vacuum pump set	(Oil required) rotary vacuum pump
Rotary pumping speed	50 Hz : 8 m³/h (2.2 L/s)/ 60 Hz : 9.6m³/h (2.6 L/s)
Vacuum limit	2 Pa
Max sputtering current	100mA
Working pressure	20Pa - 8 Pa
Vacuuming time	<5 Min(2 Pa)
Vacuum measure	Measuring range from atmosphere to 2*10^-2mbar
Chamber size	Φ150*120mm (height) scratch resistant quartz glass
Magnetron target source	Target size φ50*0.1mm(Au)/target source: Au,Ag,Pt
Operation method	Instruction Manual
Weight/size	45kg/360mm length x 300mm wide x 380mm high
Power supply	AC 110V 60Hz or AC 220V 50Hz
Power consumption	<1500W
Cooling method	Water cooling(optional)
Warranty	One year limited warranty with lifetime product support