Dual-Target Magnetron Sputtering Coater for Advanced Thin Film Deposition

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-2HD-300M
• Application: Industry, School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Stainless Steel
• Transport Package: Wooden Package
• Specification: 850mm× 760mm× 660mm
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486202200
• Production Capacity: 500 Sets Per Year

Product Description

Product Description
KS-2HD-300M dual-target magnetron sputtering system is a high-end vacuum coating equipment independently developed. It is used for the preparation of single-layer or multilayer thin films such as conductive films, alloy films, semiconductor films, ceramic films, optical coatings, and intermediate layers.
The system integrates two independent sputtering sources: one dedicated to non-conductive material sputtering (RF power supply) and one dedicated to conductive material sputtering (DC power supply).
It offers advantages of compact design, flexible operation, wide material compatibility, and ease of use, making it an ideal solution for laboratory research and pilot-scale production across various material categories.

 

Main Features

• Equipped with two independent sputtering targets: one powered by RF source for insulating materials, and one powered by DC source for conductive materials.
• Suitable for various types of targets and flexible applications.
• Compact structure, reliable performance, and convenient operation.

Technical Parameters:

Product Model	KS-2HD-300M dual head sputtering coater
Input Power	220V / 50Hz
Number of Targets	2 independent sputtering guns
Chamber Size	φ300mm× 330mm
Substrate Cooling	Water-cooled substrate holder
Ultimate Vacuum	≤9.0×10^-4 Pa
Pumping System	VRD-16 dry pump + RF-100/150 turbo molecular pump
Pumping Time	≤30 minutes to reach ≤3.0×10^-³ Pa
Gas Flow Control	1 line for Argon gas (100sccm max)
	2 lines for mixed gases (200sccm max), customizable
Film Thickness Range	0.1-1.5mm (depending on material)
Substrate Rotation	φ140mm holder, speed adjustable from 1-20rpm
Heating Capability	Room temperature to 1000°C (optional customization)
System Dimensions	900mm (W) × 650mm (D) × 1100mm (H)