Product Description: The three-target magnetron sputtering instrument is a newly independently developed coating equipment, which can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc. The KS-3HD-300M three-target magnetron sputtering instrument is equipped with three target guns, one supporting RF power supply for sputtering coating of non-conductive target materials, and two supporting DC power supplies for sputtering coating of conductive materials. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
Main Features
The KS-3HD-300M vacuum coating equipment is specially designed for coating applications, such as conductive, anti-corrosion, and optical coatings. It can be applied to electronic, semiconductor, and optical industries. It offers reliable performance, low energy consumption, and is easy to operate.
This equipment is suitable for testing in industries like electronics, optics, and materials.
It can be used for depositing a variety of films, including conductive, anti-reflective, and optical films.
It supports multiple coating technologies such as magnetron sputtering and electron beam evaporation.
The machine has a flexible structure, is user-friendly, and provides high efficiency, enabling accurate coating and film quality.
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