Spin-Based Wafer Photoresist Coater for Uniform Thin Film Deposition

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-SP-AL4
• Application: School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Aluminum
• Transport Package: Wooden Package
• Specification: 210mm × 250mm × 180mm
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486109000
• Production Capacity: 500 Sets Per Year

Product Description

The KS-SP-AL4 is a high-performance spin coater designed for precision coating applications in laboratories and research institutions. It operates on an AC220V, 50Hz power supply and is capable of reaching spin speeds from 0 up to 10000rpm, with a fine speed resolution of 1rpm. The acceleration range is adjustable between 100 and 5000rpm/s, allowing for versatile coating processes suited to a wide range of materials and requirements.
The device features a high-quality Aluminum chamber, ensuring excellent chemical resistance and durability during high-speed spinning. The substrate size accommodates samples with a diameter of up to 4 inches (100mm), making it ideal for various wafer and substrate types.

The KS-SP-AL4 offers a simple yet effective control interface, utilizing buttons and an LCD screen for easy operation. Material dispensing is manual by default, with an option to integrate a precision syringe pump for more controlled and automated processes.
To enhance process flexibility, the coater supports programmable coating curves - up to 5 segments per curve, and users can set a total of 5 different curves according to specific experimental needs. The system is equipped with a Φ6mm quick screw joint pumping port and utilizes a dry mechanical pump with a pumping rate of 1.1L/s to maintain the required vacuum level during operation.
Designed for high precision, durability, and ease of use, the KS-SP-AL4 spin coater is an ideal choice for applications in semiconductor fabrication, materials science research, and thin-film processing.

Technical Parameters:

Model	KS-SP-AL4 spin coater
Supply voltage	AC220V, 50Hz
Spin speed	0~10000rpm
Acceleration	100~5000rpm
Speed resolution	1rpm
Single step time	3000s
Substrate size	Diameter ≤ 4 inches (100mm)
Chamber material	Aluminum
Operation method	Button + LCD screen
Dispensing method	Manual dispensing, optional precision syringe pump
Coating curve	5 segments per curve, a total of 5 curves can be set
Pumping port	Φ6mm quick screw joint
Overall size	210mm × 250mm × 180mm
Total weight	8kg
Vacuum pump	Dry mechanical pump
Pumping rate	1.1L/s