Silar Deposition Coating Machine for Semiconductor, Optoelectronic, and Nanomaterial Labs

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-PVD-SLR6
• Application: Industry, School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Stainless Steel
• Max Temperature: 350c
• Transport Package: Wooden Package
• Specification: 6 position
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486202200
• Production Capacity: 500 Sets Per Year

Product Description

Product Description:
The KS-PVD-SLR6 is a precision-engineered, semi-automatic SILAR (Successive Ionic Layer Adsorption and Reaction) coating system designed for high-quality thin film deposition in research laboratories and small-scale production settings. This system utilizes a chemical solution-based technique to deposit uniform nanometer-scale thin films on various substrates through a highly controlled process of ion adsorption and reaction. The SILAR method stands out for its simplicity, low-temperature operation, and exceptional film uniformity, making it ideal for applications in photovoltaics, optoelectronics, sensor technology, and advanced nanomaterial research.
The KS-PVD-SLR6 supports multi-solution processing, typically using 3 to 6 beakers for successive dipping in cationic and anionic precursor solutions. The system's programmable logic controller (PLC) allows precise control over the dipping sequence, immersion time, number of cycles, and rinsing intervals. It enables consistent layer-by-layer film growth without the need for vacuum or high-temperature conditions, dramatically reducing operational costs and complexity. With its versatile platform, this unit supports a wide range of material systems, including metal oxides (ZnO, TiO₂), sulfides (CdS, PbS), and composite films.
Equipped with a corrosion-resistant body and chemical-resistant mechanical arms, the KS-PVD-SLR6 ensures long-term stability and clean operation. The entire process is user-configurable via a digital touchscreen interface, where users can set parameters such as substrate speed, dwell time in each solution, and total number of deposition cycles. The rotating substrate holder ensures uniform exposure during dipping, enhancing coating uniformity. The motorized arm ensures vertical movement of the substrate with smooth and repeatable motion, critical for precision layering.

A significant advantage of this system is its modular and compact design, which makes it ideal for benchtop operation. The operator can easily swap or clean solution containers without disassembling the entire setup. The system is designed with safety in mind, featuring chemical splash protection, emergency stop function, and power failure recovery.
The KS-PVD-SLR6 also offers optional features such as:

• Heated solution beakers, for reactions requiring elevated temperatures.
• Nitrogen purge integration, for oxygen/moisture-sensitive chemistries.
• Real-time process monitoring, with cycle tracking and auto-logging.

Applications of this system are widespread. In academic research labs, it is often used to deposit oxide or sulfide semiconductor layers for photoelectrochemical cells, quantum dot films, gas sensors, and supercapacitor electrodes. In industrial research, it plays a role in developing low-cost solar cell coatings and transparent conductive films.
Compared with other thin-film deposition techniques such as sol-gel, CVD, or sputtering, the SILAR method supported by the KS-PVD-SLR6 offers unmatched advantages in material flexibility, cost efficiency, and process simplicity. There is no requirement for vacuum infrastructure, making it accessible to institutions and startups with limited technical infrastructure.
In conclusion, the KS-PVD-SLR6 SILAR Coating Machine by Luoyang Kunsheng Instrument Equipment Co., Ltd. is a highly adaptable, reliable, and cost-effective solution for researchers and developers aiming to fabricate high-performance thin films using the SILAR method. With intelligent control, robust construction, and customizable options, this unit is a future-ready platform tailored for innovation in materials science.
Technical parameters:

Model	KS-PVD-SLR6
Actuator	Stepper motor
Drive mechanism	Lead screw
Dip duration	0 - 99 seconds / minutes / hours
Number of dips	1 - 999
Hot plate temperature	Ambient to 350°C
Stirrer speed	2 - 200 rpm
PC connectivity	Serial port (RS 232)
Stroke length	75 mm
Power input	230V, 50Hz
No. of position for beakers	6
No. of samples could be loaded	5
No. of programs	5
Weight (appx.)	48 Kg