High Vacuum Magnetron Sputtering Coater/Coating Machine with Bottom 4 Target Built in

• Customization: Available
• After-sales Service: on Site Installation and Online Support
• Warranty: 12 Months
• Model NO.: KS-4HD-600DG
• Application: Industry, School, Lab
• Customized: Customized
• Structure: Desktop
• Material: Stainless Steel
• Transport Package: Wooden Package
• Specification: 850mm× 760mm× 660mm
• Trademark: kunsheng
• Origin: Luoyang City, Henan
• HS Code: 8486202200
• Production Capacity: 500 Sets Per Year

Product Description

KS-4HD-600DG high vacuum magnetron sputtering instrument is a newly developed coating equipment, which can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc. KS-4HD-600DG high vacuum magnetron sputtering instrument can be equipped with up to four target guns, and the matching RF power supply is used for sputtering coating of non-conductive target materials, and the matching DC power supply is used for sputtering coating of conductive materials. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.

Main features
Up to four target guns can be selected, and the matching RF power supply is used for sputtering coating of non-conductive target materials, and the matching DC power supply is used for sputtering coating of conductive materials (the target gun can be replaced at will according to customer needs).It can prepare a variety of thin films and is widely used.
Small size and easy operation.
The whole machine has a modular design, and the vacuum chamber, vacuum pump group, and control power supply are split and can be adjusted according to the actual needs of the user.
The power supply can be selected according to the actual needs of the user. One power supply can control multiple target guns, or multiple power supplies can control a single target gun.
Technical Parameters:

Product Model	KS-4HD-600DG
Power supply voltage	220V 50Hz
Total power	<3.5KW
Inner diameter of chamber	Ø300mm
Ultimate vacuum	3.0x10-5Pa
Working temperature	RT-500ºC, accuracy ±1ºC (temperature can be increased according to actual needs)
Number of target guns	4
Cooling method of target gun	water cooling
Target size	Ø2″, thickness 0.1mm-5mm (thickness varies due to different target materials)
DC sputtering power	500W (optional)
RF sputtering power	300W
Sample stage	Ø140mm
Sample stage speed	adjustable within 1rpm-20rpm
Protective gas	Ar, N2 and other inert gases
Inlet gas path	Mass flow meter controls 2 inlet paths, 1 flow rate is 100 SCCM, 1 flow rate is 200 SCCM
Host size	850mm×760mm×660mm,